@incollection{,
	
					
					
					0EB04C5FBCE72509E25BDCD39B0D477D
				,
	author={{Gavin CRider}},
	journal={{Global Journal of Researches in Engineering}},
	journal={{GJRE}}2249-45960975-586110.34257/gjre,
	address={Cambridge, United States},
	publisher={Global Journals Organisation}203519
}

@incollection{b0,
	
	
		,
	title={{ESD Association Standard for the Development of an Electrostatic Discharge Control Program for Protection of Electrical and Electronic Parts, Assemblies and Equipment (Excluding Electrically Initiated Explosive Devices)}}
	
	
		,
	booktitle={{ESD Association}}
				
			,
	year={2014}
		
	

}

@book{b1,
	
	
		,
	author={{
			DBellmore
		}}
		,
	title={{Controlling ESD in Automated Handling Equipment. Electrical Overstress/ Electrostatic Discharge Symposium}}
				
			,
	year={2002}
			
		
	

}

@incollection{b2,
	
	
		,
	title={{Design of Semiconductor Manufacturing Equipment for Electrostatic Compatibility}}
		,
	author={{
			JBruner
		}}
	
	
		,
	journal={{Sematech ESD Symposium}}
		
			,
	year={2002}
		
	

}

@incollection{b3,
	
	
		,
	title={{A Study of the Mechanisms for ESD Damage to Reticles}}
		,
	author={{
			JMontoya
		} and {
			LLevit
		} and {
			AEnglisch
		}}
		
		
	
	
		,
	journal={{IEEE T Electron Pack}}
		
			24
			
			,
	year={2001}
		
	

}

@incollection{b4,
	
	
		,
	title={{Reticle boxes, ESD Control and Electrostatic Shielding}}
		,
	author={{
			LLevit
		} and {
			GWeil
		}}
		
	
	
		,
	journal={{Sematech ESD Impact and Control Workshop}}
		
			,
	year={2001}
		
	

}

@book{b5,
	
	
		,
	title={{Measuring the Shielding Performance of Materials}}
		,
	author={{
			JChubb
		}}
		
			,
	year={2000}
			,
	publisher={IEEE Industry Applications Conference}
		
	

}

@incollection{b6,
	
	
		,
	title={{EFM: A Pernicious New Electric Field Induced Damage Mechanism in Reticles}}
		,
	author={{
			GRider
		}}
		
	
	
		,
	booktitle={{Sematech ESD Symposium}}
				
			,
	year={2003}
		
	

}

@incollection{b7,
	
	
		,
	title={{Quantification of the risk of field induced damage to reticles}}
		,
	author={{
			GRider
		}}
		
	
	
		,
	journal={{Sematech ESD Symposium}}
		
			,
	year={2003}
		
	

}

@incollection{b8,
	
	
		,
	title={{}}
		,
	author={{
			ACRudack
		} and {
			MPendley
		} and {
			PGagnon
		}}
		
		
	
	
		,
	journal={{Induced ESD Damage on Photomasks: A Reticle Evaluation. 23rd Annual BACUS Symposium on Photomask Technology}}
		
			5256
			
			,
	year={2003}
		
	

}

@incollection{b9,
	
	
		,
	title={{Reticle Carrier Material as ESD Protection}}
		,
	author={{
			DHelmholz
		} and {
			MLering
		}}
		
	
	
		,
	journal={{Photomask Technology}}
		
			6349
			634952
			,
	year={2006}
		
	

}

@book{b10,
	
	
		,
	title={{Experimental quantification of reticle electrostatic damage below the threshold for ESD. Metrology, Inspection, and Process Control for Microlithography XXII}}
		,
	author={{
			GRider
		} and {
			TKalkur
		}}
		
		
			,
	year={2008}
			6922
			69221Y
		
	

}

@incollection{b11,
	
	
		,
	title={{Electric field-induced progressive CD degradation in reticles}}
		,
	author={{
			GRider
		}}
	
	
		,
	journal={{Photomask Technology}}
		
			7122
			71220G
			,
	year={2008}
		
	

}

@book{b12,
	
	
		,
	author={{
			GBen-Zvi
		} and {
			VDmitriev
		} and {
			EGraitzer
		}}
		
		
		,
	title={{Very High Sensitivity Mask Transmittance Mapping and Measurements Based on Non Imaging Optics with Galileo. Photomask and Next-Generation Lithography Mask Technology XV}}
				
			,
	year={2008}
			7028
			702828
		
	

}

@book{b13,
	
	
		,
	title={{}}
		,
	author={{
			GBen-Zvi
		}}
		
	
	,
	note={private communication of data produced by Brian Grenon Consultants}

}

@book{b14,
	
	
		,
	title={{High sensitivity electric field monitoring system for control of field-induced CD degradation in reticles (EFM). Photomask and Next-Generation Lithography Mask Technology XVI}}
		,
	author={{
			TSebald
		} and {
			GRider
		}}
		
		
			,
	year={2009}
			7379
			73791P
		
	

}

@book{b15,
	
	
		,
	title={{How to protect reticles from electrostatic damage. SPIE Digital Library}}
		,
	author={{
			GRider
		}}
		
			,
	year={2008. November 2018}
		
	

}

@incollection{b16,
	
	
		,
	title={{A Study of the Mechanisms for ESD Damage to Reticles}}
		,
	author={{
			JMontoya
		} and {
			LLevit
		} and {
			AEnglisch
		}}
		
		
	
	
		,
	journal={{Sematech ESD Symposium}}
		
			,
	year={2000}
		
	

}

@incollection{b17,
	
	
		,
	title={{Automation of Electrical Overstress Characterization for Semiconductor Devices}}
		,
	author={{
			CHDiaz
		}}
	
	
		,
	journal={{Hewlett Packard Journal}}
		
			45
			106
			,
	year={1994}
		
	

}

@book{b18,
	
	
		,
	title={{Gate Oxide Breakdown. ECE1768 -Reliability of Integrated Circuits}}
		,
	author={{
			NAzizi
		} and {
			PYiannacouras
		}}
		
		
			,
	year={2003}
		
	

}

@incollection{b19,
	
	
		,
	title={{Physical characterization of breakdown in metal-oxide-semiconductor transistors}}
		,
	author={{
			KLPey
		} and {
			CHTung
		}}
		
	
	
		,
	journal={{SPIE Newsroom}}
		
			2
			4
			,
	year={2007}
		
	

}

@incollection{b20,
	
	
		,
	title={{Electrical characteristics and reliability properties of metaloxide-semiconductor field-effect transistors with ZrO2 gate dielectric}}
		,
	author={{
			DCHsu
		} and {
			MTWang
		} and {
			JLee
		}}
		
		
	
	
		,
	journal={{J Appl Phys}}
		
			101
			94105
			,
	year={2007}
		
	

}

@book{b21,
	
	
		,
	title={{Diffusion in Semiconductors}}
		,
	author={{
			DShaw
		}}
		
			,
	year={2017}
			,
	publisher={Springer Handbook of Electronic and Photonic Materials}
		
	

}

@incollection{b22,
	
	
		,
	title={{Can Electrostatic Discharge Sensitive electronic devices be damaged by electrostatic fields?}}
		,
	author={{
			JSmallwood
		}}
	
	
		,
	journal={{J. Phys.: Conf. Ser}}
		
			1322
			12015
			,
	year={2019}
		
	

}

@incollection{b23,
	
	
		,
	title={{An Agile Accelerated Aging, Characterization and Scenario Simulation System for Gate Controlled Power Transistors}}
		,
	author={{
			GSonnenfeld
		} and {
			KGoebel
		} and {
			JCelaya
		}}
		
		
	
	
		,
	journal={{IEEE Autotestcon}}
		
			
			,
	year={2008}
		
	

}

@book{b24,
	
	
		,
	title={{Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items within Specially Designated Areas. SEMI Standard E163-0212}}
		
		
	

}