@incollection{,
	
					
					
					AB060373F82217C4537E4BE996862057
				,
	author={{GavinRider}},
	journal={{Global Journal of Researches in Engineering}},
	journal={{GJRE}}2249-45960975-586110.34257/gjre,
	address={Cambridge, United States},
	publisher={Global Journals Organisation}2131939
}

@book{b0,
	
	
		,
	title={{Guide to assess and control electrostatic discharge (ESD) and electrostatic attraction (ESA) for equipment}}
		,
	author={{
			E78Semi Standard
		}}
		
		
	

}

@book{b1,
	
	
		,
	title={{Guide to assess and control electrostatic charge in a semiconductor manufacturing facility}}
		,
	author={{
			E129Semi Standard
		}}
		
		
	

}

@incollection{b2,
	
	
		,
	title={{Challenges in achieving an ESD compliant supply chain}}
		,
	author={{
			FBahrenburg
		}}
	
	
		,
	journal={{Dell Supply Chain ESD Audit Presentation}}
		
			,
	year={Oct 18, 2010}
		
	

}

@book{b3,
	
	
		,
	title={{Guide for the handling of reticles and other extremely electrostatic sensitive (EES) items within specially designated areas}}
		,
	author={{
			E163Semi Standard
		}}
		
		
	

}

@incollection{b4,
	
	
		,
	title={{High sensitivity electric field monitoring system for control of field-induced CD degradation in reticles (EFM}}
		,
	author={{
			TSebald
		} and {
			GRider
		}}
		
	
	
		,
	booktitle={{Proceedings of SPIE Photomask and NGL Mask Technology XVI}}
				SPIE Photomask and NGL Mask Technology XVI
		
			,
	year={April 10, 2009}
			
		
	

}

@book{b5,
	
	
		,
	title={{Guide for electrostatic measurements on objects and surfaces}}
		,
	author={{
			E43Semi Standard
		}}
		
		
	

}

@book{b6,
	
	
		,
	title={{White Paper 2: A case for lowering component level CDM ESD specifications and requirements}}
		
		
		
			Industry Council on ESD Target Levels
		
	

}

@incollection{b7,
	
	
		,
	title={{Protection of reticles against damage from field-induced electrostatic discharge}}
		,
	author={{
			GRider
		}}
	
	
		,
	booktitle={{Semiconductor Manufacturing Magazine}}
				
			,
	year={September 2003}
		
	

}

@incollection{b8,
	
	
		,
	title={{Reticle ESD Module 1; Electrostatic sield Simulation}}
		,
	author={{
			GRider
		}}
		
	
	
		,
	booktitle={{SEMATECH Reticle ESD Workshop}}
				
			,
	year={December 2003}
		
	

}

@incollection{b9,
	
	
		,
	title={{Design of semiconductor manufacturing equipment for electrostatic compatibility}}
		,
	author={{
			JBruner
		}}
	
	
		,
	booktitle={{Sematech ESD Symposium}}
				
			,
	year={2002}
		
	

}

@incollection{b10,
	
	
		,
	title={{Induced ESD damage on photomasks: a reticle evaluation}}
		,
	author={{
			PendleyRudack
		} and {
			LevitGagnon
		}}
		
		10.1117/12.518126
		
	
	
		,
	booktitle={{Proc. 23rd SPIE Photomasks (BACUS) 2003}}
				23rd SPIE Photomasks (BACUS) 2003
		
	

}

@incollection{b11,
	
	
		,
	title={{Reticle carrier material as ESD protection}}
		,
	author={{
			DHelmholz
		} and {
			MLering
		}}
		
	
	
		,
	booktitle={{SPIE BACUS}}
				
			,
	year={September 2006}
		
	

}

@incollection{b12,
	
	
		,
	title={{Evaluating electrostatic damage prevention methods for fullscale reticle manufacturing}}
		,
	author={{
			CTurley
		} and {
			LKindt
		} and {
			JKinnearJr
		}}
		
		
	
	
		,
	booktitle={{Proc. 35th Electrical Overstress/Electrostatic Discharge Symposium}}
				35th Electrical Overstress/Electrostatic Discharge Symposium
		
			,
	year={2013}
		
	

}

@incollection{b13,
	
	
		,
	title={{Electrostatic risk to reticles in the nanolithography era}}
		,
	author={{
			GRider
		}}
		doi: 10.1117/ 1.JMM.15.2.023501
	
	
		,
	journal={{SPIE J. Micro/Nanolith. MEMS MOEMS}}
		
			15
			2
			23501
			,
	year={2016}
		
	

}

@incollection{b14,
	
	
		,
	title={{How to protect reticles from electrostatic damage}}
		,
	author={{
			GRider
		}}
		
	
	
		,
	booktitle={{SPIE Digital Library}}
				
			,
	year={November 2018}
		
	

}

@incollection{b15,
	
	
		,
	title={{Reticle boxes, ESD control and electrostatic shielding}}
		,
	author={{
			LLevit
		} and {
			GWeil
		}}
		
	
	
		,
	booktitle={{SEMATECH ESD Impact and Control Workshop}}
				
			,
	year={October 20, 2001}
		
	

}

@book{b16,
	
	
		,
	title={{SMIF container including an electrostatic dissipative reticle support structure}}
		,
	author={{
			MSmith
		} and {
			VWartenbergh
		} and {
			RPPennybacker
		} and {
			WP
		}}
		
		
		
		
			,
	year={February 2003}
		
	
	,
	note={Patent US6513654 B2}

}

@incollection{b17,
	
	
		,
	title={{Electrostatic discharge-free container for insulating articles}}
		,
	author={{
			MCLi
		}}
	
	
		,
	journal={{US Patent}}
		
			6
			
			,
	year={March 6, 2001}
		
	

}

@incollection{b18,
	
	
		,
	title={{Electrostatic discharge-free container equipped with metal shield}}
		,
	author={{
			DHCheng
		} and {
			YHLiaw
		} and {
			DGJuang
		}}
		
		
	
	
		,
	journal={{US Patent}}
		
			6
			
			,
	year={June 19, 2001}
		
	

}

@incollection{b19,
	
	
		,
	title={{EFM: A pernicious new electric fieldinduced damage mechanism in reticles}}
		,
	author={{
			GRider
		}}
		
	
	
		,
	booktitle={{SEMATECH ESD Symposium}}
				
			,
	year={Dec 2003}
		
	

}

@incollection{b20,
	
	
		,
	title={{Quantification of the risk of field-induced damage to reticles}}
		,
	author={{
			GRider
		}}
	
	
		,
	booktitle={{SEMATECH ESD Symposium}}
				
			,
	year={Dec 2003}
		
	

}

@incollection{b21,
	
	
		,
	title={{Experimental quantification of reticle electrostatic damage below the threshold for ESD}}
		,
	author={{
			GRider
		} and {
			TKalkur
		}}
		
	
	
		,
	booktitle={{Proceedings of SPIE Advanced Lithography}}
				SPIE Advanced Lithography
		
			,
	year={28 Feb 2008}
			
		
	

}

@incollection{b22,
	
	
		,
	title={{Electric field-induced progressive CD degradation in reticles}}
		,
	author={{
			GRider
		}}
	
	
		,
	booktitle={{Proceedings of SPIE Photomasks}}
				SPIE Photomasks
		
			,
	year={2008}
			
		
	

}

@incollection{b23,
	
	
		,
	title={{Electromagnetic field-induced degradation of magnetic recording heads in a GTEM cell}}
		,
	author={{
			AWallash
		} and {
			LBaril
		} and {
			VKraz
		} and {
			TGurga
		}}
		
		
		
	
	
		,
	journal={{IEEE EOS/ESD Symposium}}
		
			,
	year={September 2009}
		
	

}

@incollection{b24,
	
	
		,
	title={{An agile accelerated aging, characterization and scenario simulation system for gate controlled power transistors}}
		,
	author={{
			GSonnenfeld
		} and {
			KGoebel
		} and {
			JCelaya
		}}
		
		
	
	
		,
	journal={{IEEE Autotestcon}}
		
			,
	year={2008}
		
	

}

@book{b25,
	
	
		,
	title={{Flat panel display manufacturing ESD control technical fundamentals}}
		,
	author={{
			CHou
		}}
		
	
	,
	note={private communication, copper_hou,
	leanesd.com}

}

@incollection{b26,
	
	
		,
	title={{Tribocharging and grounding -what really happens}}
		,
	author={{
			MKRadhakrishnan
		}}
		li:activity:6519843348 663017472
		
	
	
		,
	booktitle={{comment on LinkedIn}}
				
	
	,
	note={ESD Experts discussion forum}

}

@incollection{b27,
	
	
		,
	title={{Physical failure analysis to distinguish EOS and ESD failures}}
		,
	author={{
			CHTung
		} and {
			CKCheng
		} and {
			MKRadhakrishnan
		} and {
			MINatarajan
		}}
		
		
		
	
	
		,
	booktitle={{Proc. 9th IPFA}}
				9th IPFASingapore
		
			,
	year={2002}
		
	

}

@book{b28,
	
	
		,
	title={{Investigating a new generation of ESD-induced reticle defects}}
		,
	author={{
			JWiley
		} and {
			ASteinman
		}}
		
		
			,
	year={April 1999}
			,
	address={Micro Magazine}
		
	

}

@incollection{b29,
	
	
		,
	title={{Control of Semiconductor Epitaxy By Application of an External Field}}
		,
	author={{
			DSengupta
		} and {
			DPavlidis
		}}
		
	
	
		,
	booktitle={{USAF/AFRL Research report}}
				
			,
	year={Nov 2003}
		
	

}

@incollection{b30,
	
	
		,
	title={{Effect of in-situ electric field assisted growth on anti-phase boundaries in epitaxial Fe3O4 thin films on MgO}}
		,
	author={{
			AKumar
		}}
	
	
		,
	journal={{Phys. Rev. Materials}}
		
			2
			
			,
	year={May 2018}
		
	

}

@incollection{b31,
	
	
		,
	title={{Dielectric breakdown induced epitaxy in ultrathin gate oxide -A reliability concern}}
		,
	author={{
			KLPey
		} and {
			CHTung
		} and {
			MKRadhakrishnan
		} and {
			LJTang
		} and {
			WHLin
		}}
		
		
		
		
	
	
		,
	journal={{IEEE IEDM}}
		
			,
	year={2002}
		
	

}

@incollection{b32,
	
	
		,
	title={{Can electrostatic discharge sensitive electronic devices be damaged by electrostatic fields?}}
		,
	author={{
			JSmallwood
		}}
	
	
		,
	journal={{J. Phys.: Conf. Ser}}
		
			1322
			12015
			,
	year={2019}
		
	

}

@book{b33,
	
	
		,
	title={{Deep dielectric charging and spacecraft anomalies}}
		,
	author={{
			TShu
		} and {
			Lai
		} and {
			KCahoy
		} and {
			WLohmeyer
		} and {
			ACarlton
		} and {
			RAniceto
		} and {
			JMinow
		}}
		
		
		
		
		
		
		B978-0-12- 812700-1.00016-9
		
		
	
	,
	note={Ch16, Extreme Events in Geospace}

}

@incollection{b34,
	
	
		,
	title={{Plasmaassisted discharges and charging in EUV-induced plasma}}
		,
	author={{
			MVan De Kerkhof
		} and {
			MYakunin
		} and {
			VKvon
		} and {
			SCats
		} and {
			LHeijmans
		} and {
			MChaudhuri
		} and {
			DAsthakov
		}}
		
		
		
		
		
		
	
	
		,
	journal={{SPIE Journal of Micro/nanopatterning, Materials and Metrology}}
		
			20
			1
			,
	year={Jan 2021}
		
	

}

@book{b35,
	
	
		,
	title={{Radical uncertainty: decisionmaking for an unknowable future}}
		,
	author={{
			JKay
		} and {
			MKing
		}}
		
		
			,
	year={2020}
			,
	publisher={The Bridge Street Press}
			,
	address={London}
		
	

}